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Ai JH, Liu SP, Widharta NA, Adhikari S, Anderegg JW, Hebert KR. Copper Layers Deposited on Aluminum by Galvanic Displacement. J Phys Chem C. 2011;115:22354-9. Abstract
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Hebert KR, Ai JH, Stafford GR, Ho KM, Wang CZ. Vacancy defects in aluminum formed during aqueous dissolution. Electrochim Acta. 2011;56:1806-9. Abstract
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Adhikari S, Ai JH, Hebert KR, Ho KM, Wang CZ. Hydrogen in aluminum during alkaline corrosion. Electrochimica Acta. 2010;55:5326-31. Abstract
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